A comparative study of titanium nitride (TiN), titanium oxy nitride ...
Aug 25, 2011 · X-ray diffraction (XRD) was used to examine the changes in preferred grain orientation. XRD patterns were recorded using an X'pert pro diffractometer using Cu K α (1.541 Å) radiation from 40 kV X-ray source running at 30 mA.
X-ray diffraction patterns of prepared TiN thin films at different ...
X-ray diffraction (XRD) revealed distinctive crystal structures, with all coatings exhibiting a common preferred orientation of the (111) plane and TiAlCrN showing a ternary nitride phase.
XRD diffraction peaks of 111 and 200 from TiN layers: a
The combination of Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD) and transmission electron microscopy (TEM) was used for structural analyses, while changes in optical ...
Highly Plasmonic Titanium Nitride by Room-Temperature Sputtering
Oct 25, 2019 · Here, we demonstrate highly plasmonic TiN thin films and nanostructures by a room-temperature, low-power, and bias-free reactive sputtering process. We investigate the optical properties of the...
Insights into size-dependent oxidation pathways in TiN: Atomic …
May 30, 2023 · X-ray diffraction (XRD) pattern is employed to verify the phase transformation of nanosized TiN crystals at macroscale during oxidation process at 350 – 650 °C (Fig. 1 (h)).
Thin Titanium Nitride Films Deposited using DC Magnetron Sputtering ...
Jan 1, 2012 · Titanium (Ti) and TiN thin films of 200 nm thick were deposited by DC magnetron sputtering process on plain silicon substrates. Initial AFM and XRD characterization study was carried to study the crystal structural properties of these thin films.
Titanium Nitride - ACS Material
May 13, 2019 · Titanium nitride (TiN), an alternative plasmonic material to gold, possesses unique physiochemical properties most notable in plasmonic devices. A compatible material within biological environments and the semiconductor industry, TiN exhibits superior properties to noble metals such as high temperature durability, chemical stability, corrosion ...
Ion-beam assisted sputtering of titanium nitride thin films - Nature
Apr 18, 2023 · In addition, x-ray diffraction (XRD) analysis was conducted on films grown from both methods to determine the phase of TiN. Sheet resistance measurements followed via a four probe on a...
XRD analysis of TiN films. (a) XRD ω-2θ diffraction pattern and (b ...
The structural and electrical properties of TiN thin films were characterized with x-ray diffraction (XRD), atomic force microscopy (AFM), scanning...
X-Ray Diffraction of Solid Tin to 1.2 TPa | Phys. Rev. Lett.
Aug 12, 2015 · We report direct in situ measurements of the crystal structure of tin between 0.12 and 1.2 TPa, the highest stress at which a crystal structure has ever been observed. Using angle-dispersive powder x-ray diffraction, we find that dynamically compressed Sn transforms to the body-centered-cubic (bcc) structure previously identified by ambient ...