SME-200E - ULVAC, Inc.
SME-200E is cluster type Sputtering system for research and development and production purpose. Substrate size up to Φ200mm. Process chamber up to three process chamber can …
Cluster-type Sputtering System SME-200 - ULVAC GmbH
The SME Series (SME-200) is a series of space-saving, low-cost cluster-type sputtering systems ideal for SAW devices and compound semiconductors.The SME-series lets you create a …
World's first*, Low temperature PZT sputtering technology in mass ...
Mar 25, 2015 · This multi-chamber type sputtering system (model SME-200) allows for consistent process flow, optimizing each individual layer inside each process chamber respectively, …
ULVAC Launches Revolutionary PZT Piezoelectric Thin-film Process ...
Aug 16, 2019 · This multi-chamber sputtering system (model SME-200) allows for continuous process flow, optimizing each individual layer inside its own process chamber to achieve high …
SME-200 | 株式会社アルバック | 半導体/MEMS ... - SEMI-NET
May 31, 2024 · プロセス室を複数搭載可能（最大3室の200E、最大5室の200J、および最大7室の200）なマルチチャンバ型のスパッタリング装置です。 ・φ200mm基板を搬送可能 ・プロ …
ULVAC offers a wide range of sputtering systems with a proven track record. Multi-chamber type sputtering system capable of installing multiple process chambers (up to 3 for 200E, up to 5 for …
ULVAC - 200mm PVD cluster system
The SME system is available with several core types; square, hexagonal or octaganol. This allows the user to configure the system from R&D to high volume production. Additionally, the …
The value will be measured when no substrate is loaded and the vacuum chamber is clean and at the ambient temperature. Basically, this value will be obtained when no target is loaded in the …
Cluster-typeSputtrering System SME-200E - ULVAC MALAYSIA …
SME-200E is cluster type Sputtering system for research and development and production purpose. Substrate size up to Φ200mm. Process chamber up to three process chamber can …
Cluster-type Sputtering System SME-200E : ULVAC Singapore
SME-200E is a cluster-type Sputtering system for research and development and production purposes. Substrate size up to Ø200mm. Process chamber up to three chambers can be …