Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creation of a …

Plasma-enhanced chemical vapor deposition (PECVD) is another technique for depositing thin films of carbon-based materials. In PECVD, a plasma is used to activate the precursor gases, allowing for lower deposition temperatures and higher deposition rates …

Dec 15, 2022 · In this work, PECVD was utilized to fast (∼15 min) and uniformly grow vertical carbon nanosheets on the surface of the disproportional-SiOx (d-SiO x) particles to construct a composite anode with an excellent electrochemical performance.

Apr 1, 2019 · We carry an investigation on the structural and optical properties of amorphous carbon films, containing fluorine and sulfur in their composition, grown by plasma enhanced chemical vapor (PECVD) and plasma immersion ion implantation deposition (PIIID) techniques.

Our research group has pioneered a technique to grow a unique covalently bonded graphene-carbon nanotube hybrid material using plasma-enhanced chemical vapor deposition (PECVD) in a single step.

This paper describes a modeling method for film thickness variation within plasma enhanced chemical vapor deposition (PECVD) processes using either conventional reactive gases or metal organic pre-cursor feedstocks.

Abstract— Plasma enhanced chemical vapor deposition (PECVD) is a versatile technique to obtain vertically dense-aligned carbon nanotubes (CNTs) at lower temperatures than chemical vapor deposition (CVD). In this work, we used magnetron sputtering to deposit iron layer as a catalyst on silicon wafers.

PECVD growth of carbon nanotubes: from experiment to simulation. Nanostructured carbon materials show a tremendous variety in atomic structure, morphology, properties, and applications.

For make requirements demanded to CNT, the plasma-enhanced chemical vapor deposition method (PECVD) is most promising [20, 21]. The initial stage of the CNTs' growing process is based on the thin layer formation of the transition metal, which are formed catalytic centers (CC) during subsequent destruction. On the

We report on the growth of carbon nanotubes by plasma-enhanced chemical vapor deposition (PECVD). We used acetylene and ammonia gas mixtures with a process pressure of 1 Torr for the growth of carbon nanotubes on nickel layers.