To precisely create these challenging structures, Lam’s Flex ® product family offers differentiated technologies and application-focused capabilities for critical dielectric etch applications.

Jul 11, 2011 · The new EFx module incorporates an innovative process used to contour the tungsten film deposition, providing up to 150 percent step coverage. This enables complete fill …

Lam Research Corporation is an American supplier of wafer-fabrication equipment and related services to the semiconductor industry. [2] Its products are used primarily in front-end wafer …

Feb 19, 2025 · Lam Research Corp. (Nasdaq: LRCX) today introduced Akara®, a breakthrough innovation in plasma etch and the most advanced conductor etch tool available. Akara delivers …

Aug 10, 2016 · Lam led the transition of chemical vapor deposition (CVD) tungsten nucleation to ALD tungsten nucleation with its PNL technology. The company continued that leadership by …

The data for EFX is promising. Trials for patients with at-risk fatty liver (NASH, MASH) are enrolling. Message me if you’d like more information. Glad to…

LAM RESEARCH / NOVELLUS EFX MOD C for Concept 3 Altus is a versatile, high-precision etch reactor designed to efficiently and repeatably control etching chemistry and process …

lam efx-155 (10055443) de installed 2. system information 3) mfc nf3 100sccm 4) control valve 5) heater 1. genaral infomaition maker serial no. status 300mm altus (chamber only) 2016 …

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