Feb 29, 2024 · Here a method is presented to optimize these process parameters during ALD deposition using high-aspect ratio nanowires and transmission electron microscopy (TEM). …

May 24, 2021 · In this blog post, we want to share a collection of transmission electron microscope (TEM) images that clearly visualize that plasma ALD can, indeed, provide …

Atomic layer deposition (ALD) is a thin film deposition technique where chemical precursors are sequentially introduced to the surface of a substrate where they chemically react directly with …

Jun 1, 2014 · Atomic layer deposition (ALD) is a vapor phase technique capable of producing thin films of a variety of materials. Based on sequential, self-limiting reactions, ALD offers …

Jun 1, 2010 · The capacitor structures with aspect ratio up to 50:1 (depth to diameter) were coated by atomic layer deposition (ALD). An advanced focused ion beam assisted preparation …

Atomic layer deposition (ALD) is a thin-film deposition technique based on the sequential use of a gas-phase chemical process; it is a subclass of chemical vapour deposition. The majority of …

We report a method for depositing patterned dielectric layers with submicron features using atomic layer deposition. The patterned films are superior to sputtered or evaporated films in …

Atomic layer deposition (ALD) showcases innovation in novel structure synthesis, area-selective deposition, low-temperature deposition, and more.

Mar 25, 2021 · In this work, we report on efforts to employ electron diffraction pair distribution function (ePDF) measurements using more broadly available transmission electron …

During ALD, TEM detectors could be damaged as they are being exposed to corrosive volatile chemical compounds. Here we present a dedicated TEM holder design, where ALD deposition …