SU-8 series photoresists use gamma-butyrolactone or cyclopentanone as the primary solvent. SU-8 was originally developed as a photoresist for the microelectronics industry, to provide a high-resolution mask for fabrication of semiconductor devices.

andard viscosities. This processing guideline document addresses four products: SU-8 2025, SU-8 2035, SU- 2050 and SU-8 2075. Figure 1 provides the informa-tion required to select the appropriate SU- 8 2000 resist and spin conditions to achieve the de. of 300 r. kness vs.

Some of SU8 are provided by CNS, as marked in the Comment column, 3 types of SU-8 (2015,2025, 2050) have been verified in LISE clean-room of CNS (SU-8 banch, rightside spinner, which are highli ghted.

SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify.

Jan 1, 2001 · In this paper, we report the optimization results of SU-8 EPON-based photoresist (PR) polymerization and its possible microfluidic and MEMS applications. First, the optimization results of SU-8 polymerization under near UV lithography are reported.

Gersteltec offers several kinds of classic SU-8 photoresists products under different products forms that can give your company an extra competitive edge. GM10xx and GMPI10xx series for semiconductors applications.

uced coating stress. The viscosity range of SU-8 3000 allows for film thicknesses of 4 to 100 . m in a single coat. SU-8 3000 has excellent imaging characteristics and is capable of producing very high, over 5:1 asp.

SU-8 is a negative acting resist that can be purchased from Microchem in various thickness formulations from 1um to >100um (see http://www.microchem.com/Prod-SU82000.htm). SMIF supplies the SU8-10 formulation which can be coated to a thickness of 10um to 25um depending on spin speed, as well as the SU-8 developer.

Jul 26, 2013 · Here we present a new bonding protocol for SU-8 negative tone photoresist that exploits the chemical modifications induced in the resin by exposure to 254 nm (UVC) light.

Herein, we present SU8-graphene-based nano-composite containing RGO flakes as a patternable conductive polymer with electrical properties superior to other graphene-based polymer composites and well-enhanced mechanical properties.