BEAMER provides innovative tools for PEC and advanced process correction for nanoscale electron-beam lithography. A robust 2D PEC is complemented by a model-based shape and …

Aug 1, 2022 · Based on a simple interpretation of the spread, a proximity effect correction (PEC) algorithm was established. Implementing this, we could realize high-quality nanostructures …

Mar 1, 2023 · This paper proposes a fast and accurate shape-based proximity effect correction (PEC) algorithm based on pattern edge shape adjustment (PESA) for electron beam …

Sep 8, 2017 · Electron-beam lithography (EBL) is an important technique in manufacturing high-resolution nanopatterns for broad applications. However, the proximity effect in EBL can …

Fast, Easy and Accurate PSF Simulation and Visualization. Manage, Maintain and Archive all PSFs with an Interface to BEAMER & LAB. A Point Spread Function (PSF) is the essential …

The proximity effect correction (PEC) of patterns has significant applications in electron beam lithography (EBL) systems that cannot adjust dosage arbitrarily. This paper proposes a PEC …

Energy deposition with PEC Energy deposition w/o PEC EBL pattern with PEC D H 1

PEC method for EBL based on the fast multipole method (FMM). FMM in PEC just calculates the interaction between all the expo-sure points, and thus, it gets rid of the limitation of the equally …

I review the work of proximity effect correction (PEC) in electron-beam (e-beam) lithography with emphasis on dose modification and shape modification PEC techniques. I. Proximity Effect …

EBL pattern with PEC https://doi.org/10.1063/1.3437589 Accurate and Efficient Proximity Effect Correction for Electron Beam Lithography Based on Distributed Parallel Computing