ASML’s EUV lithography technology is indispensable to the production of cutting-edge microchips, making it a linchpin of the ...

4 have developed a soft-X-ray/EUV microscope in the water window that achieves sub-visible-light resolution. The microscope consists of a laser-plasma source and zone-plate optics to focus the ...

ASML and Intel said this week that the latter had achieved a significant milestone with ASML's High-NA lithography system by turning on its light source and making the light reach resist on a ...

Research org Imec claims it has demonstrated the viability of ASML's next generation extreme UV technology for next generation chip manufacturing, showing off how it can create patterned ...

A research partnership led by Lawrence Livermore National Laboratory (LLNL) has been formed to investigate the next evolution of extreme ultraviolet (EUV) lithography. The team will participate in the ...

As US restrictions continue getting tougher, Chinese researchers are coming up with innovative approaches to chip ...

Extreme Ultraviolet (EUV) lithography is a critical technology for manufacturing semiconductor chips smaller than 7 ...

There is also the question of how to generate EUV light. As mentioned above, the mirrors in the projection optics only reflect 72% of the incident EUV radiation at best. A typical projection lens ...

Clay Klein has been announced as the 2025 recipient of the $10,000 Nick Cobb Memorial Scholarship by SPIE, the international society for optics and photonics ... available at JILA and focuses on ...

Nonetheless, we keep hearing about mask 3D effects here. What’s that about? Kasprowicz: In EUV, you have reflective optics. If you expose light perpendicular to a mirror, it’s going to come right back ...

Furthermore, the Lab developed efficient multilayer optics that are instrumental in transporting and delivering the EUV light for lithography. Previously, LLNL partnered with ASML to exploit the Lab’s ...