Today, our competence extends to vacuum coatings, such as PECVD coating systems developed by Manz. Vacuum technology is used in many high-tech markets. It is the key to trailblazing innovation in ...

During the production process, the 4-, 6- and 8- inch (100, 150 and 200 mm) diameter wafers undergo a PECVD process ...

--(BUSINESS WIRE)--Oct. 29, 2001--AKT, an Applied Materials company and the world's leading supplier of plasma-enhanced chemical vapor deposition (PECVD) systems to the flat panel display ...

PECVD (r.f.-PECVD) system (Plasma Technology), at 200 W power and 1,000 mbar process pressure, the same system that is widely used for the growth of thin films. The Ni powder catalyst (Goodfellow ...

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PECVD (plasma-enhanced chemical vapor deposition) can be used to lower the temperature required for the reaction, but then there is difficulty in maintaining a uniform plasma inside the pipe and ...

As the world's second largest tool vendor noted, plasma-enhanced chemical vapor deposition (PECVD) processes are typically performed in single-wafer reactors. IRad incorporates TEL's proprietary ...

SANTA CLARA, Calif. – Applied Materials Inc.'s AKT unit here today announced a new plasma-enhanced chemical vapor deposition (PECVD) system for use in developing fifth-generation, flat-panel displays.

To deposit the AlOx layer it utilized an industrial batch-type LF-PECVD system provided by German PV equipment manufacturer Centrotherm, whose researchers also contributed to the research.

Researchers at the Korea Institute of Machinery and Materials have developed a way to grow 2d transition metal dichalcogenides heterostructures across 100mm wafers using plasma-enhanced chemical ...