KWANGJU, South Korea, Apr 21, 2005 (Xinhua via COMTEX) -- South Korea's Jusung Engineering Co. Ltd. has developed a new generation of plasma enhanced chemical vapor deposition (PECVD) system, the ...

To specifically address these issues and customers, San Jose-based semiconductor manufacturing equipment provider Novellus Systems Inc. today at SemiCon West launched its VECTOR Extreme PECVD system, ...

High rate SiO 2 PECVD. Image Credit: Oxford Instruments Plasma Technology. High rate SiO 2 PECVD. Image Credit: Oxford Instruments Plasma Technology. Specifications. Clustering can be done for up to ...

"Display manufacturers can use the AKT 15K PECVD system to make approximately 2.5 times more 15-inch flat panel displays and over 1.5 times more 17 to 21-inch displays than Generation 4 systems, ...

San Jose-based Novellus Systems Inc. today unveiled the latest enhancement to its 300-mm VECTOR plasma-enhanced chemical vapor deposition (PECVD) platform — VECTOR Express – which the company says ...

Using PECVD equipment, the research team succeeded in producing two types of 4-inch wafer-scale heterostructures. The first type, a heterostructure of WS₂ and graphene, ...

Singulus' ICP-PECVD tool Singular Singulus introduces the ICP-PECVD tool for the development of novel passivation layers, Singular. September 2, 2011 pv magazine ...

INDEOtec will supply the University with its package for both PECVD and PVD processes, which are vital in the production of high efficiency thin film cell concepts, including heterojunction.