Carbon nanofibres were synthesized using an industry-standard radio-frequency (13.56 MHz) PECVD (r.f.-PECVD) system (Plasma Technology), at 200 W power and 1,000 mbar process pressure, the same ...

Plasma Enhanced Chemical Vapor Deposition of Diamond-Like Carbon Coatings This article reports the result of a study demonstrating the potential of a new PECVD technology to deposit DLC based films on ...

German automation specialist Acp systems developed an advanced robotics solution integrating image processing to handle a ...

In the first scheme, a PECVD hardmask is deposited over a spin-on-carbon (SOC) layer. The resist pattern is transferred into the hardmask, which in turn is used for pattern transfer into the much ...

By RF plasma-enhanced chemical vapour deposition (rf-PECVD), carbon atoms diffuse into the hot nickel. Then, as the nickel saturates, carbon atoms are forced out from under each particle in the form ...

During the production process, the 4-, 6- and 8- inch (100, 150 and 200 mm) diameter wafers undergo a PECVD process ...

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--(BUSINESS WIRE)--Oct. 29, 2001--AKT, an Applied Materials company and the world's leading supplier of plasma-enhanced chemical vapor deposition (PECVD) systems to the flat panel display ...

SANTA CLARA, Calif. – Applied Materials Inc.'s AKT unit here today announced a new plasma-enhanced chemical vapor deposition (PECVD) system for use in developing fifth-generation, flat-panel displays.

To deposit the AlOx layer it utilized an industrial batch-type LF-PECVD system provided by German PV equipment manufacturer Centrotherm, whose researchers also contributed to the research.