SANTA CLARA, Calif. — Enabling the development of next-generation devices, Applied Materials Inc. here today introduced a new technology that promises to extend the life of traditional gate-oxide ...

2. Activation of reactants: The precursors require activation to initiate the chemical reaction, which can be achieved through various methods.In thermal CVD, the temperature of the reaction chamber ...

By choosing the gases that are injected into the CVD chamber, specific materials can be grown. Various types of materials structures can be obtained, including monocrystalline ...

The researchers' approach is based on chemical vapor deposition (CVD), a method in which a substrate is put in a vacuum chamber and is exposed to particular chemical vapors.

Chemical vapor deposition, or CVD, is a commonly used method of creating thin films used in semiconductor manufacturing. Chemical vapor deposition is a process that can trace its roots back to a 1950s ...

In a CVD chamber, a continuous blast of superhot microwaves heats methane and hydrogen gases up to 1,000 degrees Celsius (1,832 degrees Fahrenheit), turning them into a super-reactive plasma ...

For nearly 10 years, the standard method of fluorine delivery to the CVD chamber has been nitrogen trifluoride, which is decomposed into fluorine and nitrogen immediately before use. The NF 3 is ...