These dangling bonds then readily adsorb reactants and facilitate ALD film growth. We have demonstrated crystalline GaN growth at room temperature using this approach. Many other films grown using ...

Imagine being able to deposit a film of material just a few atomic layers at a time. As impossible as that sounds, atomic layer deposition (ALD) is a reality. In fact, it’s being used in an ...

Novel surface science characterization of low – cycle (less than 6 ALD cycles) ALD film deposition on Li-ion battery cathode materials is being used to elucidate that true mechanism for improved ...

Atomic layer deposition (ALD) is a process used to deposit a wide variety of thin film materials from the vapor phase of matter. The system involves alternating pulses of gaseous precursors that ...

In addition to our cluster tool, ALD center Finland houses 12 smaller ALD/ALEt tools for thin film deposition and ALD/ALEt process development studies. The center has solid knowhow of hundreds of ALD ...