ALD offers a number of advantages, all of which arise from the self-limiting, sequential reactions. First, while deposition is not exactly a single atomic layer per cycle, film thickness is well ...

Novel surface science characterization of low – cycle (less than 6 ALD cycles) ALD film deposition on Li-ion battery cathode materials is being used to elucidate that true mechanism for improved ...

Typically, deposition takes place in a large batch reactor. The area to be covered is much larger, as is the sheer volume of precursor required per ALD cycle. Meanwhile, film quality requirements are ...

They deposited all the films at a temperature of 200 C and a cycle time of 25 seconds. They then controlled the SiOx thickness by adjusting the number of atomic layer deposition (ALD) cycles and ...

Sub-second ALD cycle times enable fast and efficient exploration of applications that require thick films. The system covers difficult patterned substrates like advanced-generation DRAM device wafers, ...

cathodes using a TiO₂ and Al₂O₃ bilayer coating via low-temperature ALD. This method improved capacity retention by over 90.4 % and achieved a specific discharge capacity of 146 mAh/g after 100 cycles ...

This type of design that you can only get from knowledgeable ALD experts, optimizes deposition uniformity and minimizes cycle time and precursor use. The Fiji 200 comes in several different ...